Application Technology of Microelement-Modified Titanium Implant Surface

1.1 Plasma Immersion Ion Implantation Method
The traditional ion implantation method accelerates charged ions and shoots them vertically onto the material surface to form a coating with special properties. The plasma immersion ion implantation method (PIII) is an improvement of the ion implantation method. This method immerses the material in plasma and performs ion implantation from multiple angles, solving the problem of strict requirements for the injection angle in ion implantation technology, and this technology does not affect the surface structure of the material, making it suitable for complex materials such as implants.

The composition of the surface film after implantation can be the elemental form of the modified element, the oxide of the modified element, or the compound of the modified element and the base element, depending on the material composition of the modified element and the conditions during implantation. For example, when modifying titanium implants with non-metallic elements, compounds such as TiN and TiF4 can be formed, and when modifying titanium implants with metallic elements, oxides such as ZnO, MgO, or pure metal zinc or magnesium deposition can be formed.

1.2 Micro Arc Oxidation Method
The micro arc oxidation method (MAO) forms a thick and stable oxide film layer on the metal surface by relying on the instantaneous high temperature generated by arc discharge in the electrolyte. The composition and performance of this film layer are mainly affected by the chemical composition of the electrolyte. The physical properties such as thickness, pore size, and roughness of the oxide film produced by this method are easier to control compared to other methods. Similar to the PIII method, the MAO method can also form a uniform, closely adhered, and wear-resistant oxide film on materials with complex surface structures.

1.3 Others
Magnetron Sputtering Method: This method uses particle impact on the surface of the target material to sputter out particles from the surface of the target material and allows them to cool and deposit on the material surface, forming a nano-coating structure. This coating is relatively thin, but it is more closely bonded. The technical characteristics of magnetron sputtering are low substrate heating, relatively easy control of process parameters, and suitability for large-area coating; Electrochemical Deposition Method: The material is placed in the corresponding elemental solution or molten salt, and through discharge, a metal film is deposited on the surface of the material at the anode. Combining this method with the PIII method is called plasma immersion ion implantation and deposition (PIII&D), and it has wide applications in the biomedical field. When choosing the modification method, it is necessary to consider the properties of the material, the properties of the modified element, efficiency, and energy consumption, and for the same element, comparative studies can be conducted to determine whether different modification methods will produce different biological effects.